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| Design Basis and Research Progress of HiPIMS Power Supply |
| | GONG Chunzhi, WU Houpu, HU Tianshi, TIAN Xiubo |
| | 2022,35(5):1-9 [Abstract(840)] [View PDF 811.19 K (440)] |
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| Review of Film Preparation by Bipolar Pulsed High Power Impulse Magnetron Sputtering |
| | ZHU Xiangrui1, HAN Mingyue1, FENG Pengbo, SUN Yuqiang, LI Liuhe |
| | 2022,35(5):10-22 [Abstract(735)] [View PDF 18.45 M (465)] |
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| Research Progress of Simulation Technique on High Power Impulse Magnetron Sputtering |
| | CUI Suihan, GUO Yuxiang, CHEN Qiuhao, WU Zhongzhen |
| | 2022,35(5):23-41 [Abstract(777)] [View PDF 12.67 M (394)] |
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| Discharge Characteristics of HiPIMS and Its Regulation on the Structure and Properties of Thin Films |
| | LI Kun, GAO Gang, YANG Lei, XIA Fei, SUN Chunqiang, TENG Xiangqing, ZHANG Yumin, ZHU Jiaqi |
| | 2022,35(5):42-55 [Abstract(732)] [View PDF 8.40 M (494)] |
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| Research Progress of Cr Coating Based on High Power Impulse Magnetron Sputtering |
| | DING Xiaoyun, ZHANG Jin, TIAN Xiubo, WU Zhongzhen, LIAN Yong |
| | 2022,35(5):56-69 [Abstract(624)] [View PDF 55.92 M (470)] |
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| Application Research Progress of High Power Impulse Magnetron Sputtering in the Preparation of Metal Nitrides Coatings |
| | WEI Yongqiang, GU Yanyang, JIANG Zhiqiang |
| | 2022,35(5):70-92 [Abstract(663)] [View PDF 78.30 M (459)] |
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| Research Progress on Optoelectronic Thin Films Deposited by HiPIMS: Discharge Characteristics and Parameter Adjustment |
| | ZHANG Haibao, LIU Yang, CHEN Qiang |
| | 2022,35(5):93-104 [Abstract(559)] [View PDF 11.55 M (320)] |
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| Research Progress of Crystalline Thin Films by High Power Impulse Magnetron Sputtering at a Low Temperature |
| | BAI Xuebing, CAI Qun, ZHANG Xuhai |
| | 2022,35(5):105-115 [Abstract(963)] [View PDF 6.08 M (369)] |
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| High Ionization Magnetron Sputtering Technology and Industry Applications |
| | MA Minyu, LIU Liangliang, LI Tijun, LI Xiteng, CUI Suihan, WU Zhongzhen |
| | 2022,35(5):116-144 [Abstract(621)] [View PDF 57.44 M (405)] |
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| Effect of New HiPIMS Mode with High Ignition Pulse on Structure and Properties of TiN / CrN Multilayers |
| | GAO Kaichen, GNOG Chunzhi, XU Xiaochen, TIAN Xiubo |
| | 2022,35(5):145-154 [Abstract(655)] [View PDF 15.30 M (327)] |
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| CrAl Target Discharge Behavior of Electric and Magnetic Fields Synergistically Enhancing HiPIMS and Preparation of CrAlN Film |
| | LI Chunwei1,2, TIAN Xiubo |
| | 2022,35(5):155-162 [Abstract(756)] [View PDF 9.64 M (359)] |
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| Plasma Spatial Distribution and Transport Behavior of High Power Impulse Magnetron Sputtering in Cylindrical Cathode |
| | CUI Suihan, LI Tijun, LI Rui, WU Zhongcan, MA Zhengyong, WU Zhongzhen |
| | 2022,35(5):163-171 [Abstract(606)] [View PDF 13.02 M (396)] |
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| Measurement of Fracture Toughness of TiAlN Thin Film by Micro Indentation Based on Digital Twin |
| | JIANG Zhitao, GAO Jianying, LEI Mingkai |
| | 2022,35(5):172-183 [Abstract(599)] [View PDF 21.99 M (429)] |
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| Plasma Discharge Characteristics and Microstructure of CrNx Coating Deposited by Reactive HiPIMS |
| | QI Yuxing, ZHOU Guangxue, ZUO Xiao1, DU Hong, CHEN Rende, WANG Aiying |
| | 2022,35(5):184-191 [Abstract(730)] [View PDF 11.79 M (431)] |
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| Effects of Pulse Frequency on the Microstructure and Mechanical Property of TiN Films Prepared by HiPIMS |
| | GAO Haiyang, ZHANG Bin, WEI Dianzhong, DAN Min, JIN Fanya |
| | 2022,35(5):192-199 [Abstract(607)] [View PDF 5.95 M (347)] |
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| Effect of Substrate Bias on the Properties of Craln Films Prepared by High Power Pulsed Magnetron Sputtering |
| | ZHANG Hui, GONG Chunzhi, WANG Xiaobo, ZHANG Weixin, TIAN Xiubo |
| | 2022,35(5):200-209 [Abstract(683)] [View PDF 10.03 M (274)] |
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| Structure and Properties of Cr Films Deposited by High Power Impulse Magnetron Sputtering on Inner Surface of Tube |
| | WU Houpu, TIAN Xiubo, ZHENG Linlin, GONG Chunzhi, ZHANG Hui |
| | 2022,35(5):210-216 [Abstract(587)] [View PDF 6.67 M (341)] |
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| (CuNiTiNbCr)Cx Nanocomposite High Entropy Carbide Film Prepared by High Power Pulsed Magnetron Sputtering |
| | LI Yantao, JING Peipei, ZENG Xiaokang, LIU Mao, JIANG Xin, LENG Yongxiang |
| | 2022,35(5):217-227 [Abstract(758)] [View PDF 40.80 M (453)] |
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| Fabrication and Plasma Properties of TiB2, TiBN Films by HiPIMS |
| | WU Zhengtao, YE Rongli, LI Haiqing, WANG Qimin |
| | 2022,35(5):228-235 [Abstract(1191)] [View PDF 7.43 M (466)] |
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| High Purity Ti2AlC MAX Phase Coatings Deposited By HiPIMS Technique Combined With Subsequent Heat Treatment |
| | ZHOU Dingwei, LI Zhongchang, WANG Zhenyu, MA Guanshui, KE Peiling, HU Xiaojun, WANG Aiying |
| | 2022,35(5):236-245 [Abstract(653)] [View PDF 26.43 M (326)] |
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| Particle Energy Regulation of Crystalline Alumina Films Sputtered at Room Temperature by HiPIMS |
| | GAO Fangyuan, XU Yi, Li Guodong, LI Guang, XIA Yuan |
| | 2022,35(5):246-253 [Abstract(685)] [View PDF 2.31 M (329)] |
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| Plasma Characteristics of TiNb Target and Its Effect on Film Properties by High-power Impulsed Magnetron Sputtering |
| | CHEN Changzi, LI Yantao1, ZENG Xiaokang, MA Donglin, JIANG Quanxin, LENG Yongxiang |
| | 2022,35(5):254-263 [Abstract(532)] [View PDF 16.92 M (289)] |
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| Glow Discharge of Hollow Cathode During Cu Plating on Thin Tube Surface |
| | GAO Kaichen, LIU Shiyuan, GONG Chunzhi, TIAN Xiubo |
| | 2022,35(5):264-271 [Abstract(542)] [View PDF 1.07 M (262)] |
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| Effects of Pulsed Bias on the Corrosion Behavior of Diamond-like Carbon Film Prepared on the Surface of 316L Stainless Steel |
| | CHEN Dongxu, GUO Yangyang, QI Jilong, ZHOU Yanwen |
| | 2022,35(5):272-278 [Abstract(591)] [View PDF 6.93 M (408)] |
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