| 摘要: |
| 高功率脉冲磁控溅射(HiPIMS)沉积制备 TiBx时，涂层化学计量比 x 随 HiPIMS 脉冲宽度的减小而降低。采用原位等离子体质谱仪研究 TiBx涂层的沉积等离子体性质，采用弹性反冲探测分析技术测量涂层元素组成，采用 X 射线衍射分析涂层相结构，采用 X 射线光电子能谱研究涂层键价结构，通过纳米压痕仪测试涂层力学性能。结果表明，减小 HiPIMS 脉冲宽度后出现气体稀释效应，加之 Ti 的一次离化能低于 B，即 Ti 优先 B 发生离化，导致 Ti+ / B+ 离子束流比增大，从而降低 TiBx涂层化学计量比 x，揭示了 TiBx涂层化学计量比演变机制。此外，在短 HiPIMS 脉冲宽度溅射 TiB2靶材条件下，引入 N2气体，当 N2流量为 10 mL / min、HiPIMS 脉冲宽度为 30 μs 时，成功制备出具有纳米晶 TiN、TiB2复合结构特征的新型 TiBN 涂层，此 TiBN 涂层硬度及弹性模量分别为 37.5 GPa、300 GPa，为具有优异力学性能纳米复合涂层的设计制备提供实验和理论指导。 |
| 关键词: HiPIMS TiBN 纳米复合 等离子体 离化能 |
| DOI：10.11933/j.issn.1007?9289.20220114001 |
| 分类号:TG156;TB114 |
| 基金项目:国家自然科学基金(51901048)和广东省自然科学基金(2019A1515012234)资助项目 |
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| Fabrication and Plasma Properties of TiB2, TiBN Films by HiPIMS |
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WU Zhengtao1, YE Rongli1, LI Haiqing1, WANG Qimin1,2
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1.School of Electromechanical Engineering, Guangdong University of Technology, Guangzhou 510006 , China;2.Key Laboratory of Green Fabrication and Surface Technology of Advanced Metal Materials, Ministry ofEducation, Anhui University of Technology, Maanshan 243000 , China
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| Abstract: |
| The stoichiometric ratio x of the TiBx prepared by high power pulsed magnetron sputtering (HiPIMS) decreases with reduction of pulse length. Plasma properties during TiBx deposition are investigated by In situ Mass Spectrometry. Elemental compositions, phase structure, chemical bonding state, and mechanical properties of the films are investigated by elastic recoil detection analysis, X-ray diffraction, X-Ray photoelectron spectroscopy, and nanoindentation tests, respectively. The results illustrate that gas rarefaction occurs when reducing the pulse length. In addition, the first ionization potential of Ti is lower compared to that of B, which leads to a preferential ionization of Ti atoms. Those produce an increase of Ti+ / B+ flux ratio and reduce of stoichiometric ratio x of the TiBx. Therefore, the primary mechanism behind the evolution of stoichiometric ratio x of the TiBx is indicated. Hardness and elastic modulus of the TiBN reach the largest recorded values of 37.5 GPa and 300 GPa when the N2 flow rate and the pulse length of the HiPIMS are set at 10 mL / min and 30 μs, respectively. TiBN nanocomposite films with TiN and TiB2 nanocrystals are fabricated by HiPIMS with N2 under a short HiPIMS pulse length. The above results will provide guidance on design and fabrication of nanocomposite hard coatings with excellent mechanical properties. |
| Key words: HiPIMS TiBN Nanocomposite Plasma Ionization potential |
