AN Mingdong, QIAN Jianguo, YANG Cheng, MA Yue, WANG Qianzhi, TANG Chunbo, SHEN Jianxin, ZHOU Fei
Titanium alloys are widely used as biocompatible materials for bone implantation and dental implant surgery; however, their low wear resistance can lead to implant failure. In addition, wear and tear may cause the release of harmful metal ions, such as vanadium and aluminum ions, from titanium alloys into the human body, thereby posing potential health risks. This issue can be effectively addressed by depositing a nitride film on the surface of titanium alloys via magnetron sputtering. Among various nitride films, MoN films have attracted considerable attention owing to their high hardness, favorable Young’s modulus, and relatively low coefficient of friction. Furthermore, Si3N4, a new generation of bioceramic materials, possesses advantageous radiographic, anti-infective, biocompatibility, and osseointegration properties, aside from the excellent characteristics typically expected of ceramic materials. Therefore, the preparation of MoSiN films on titanium alloy substrates presents a promising approach to mitigate the insufficient mechanical and tribological performance of titanium alloys. In this study, MoSiN thin films were deposited onto Ti-6Al-4V substrates and Si (100) wafers using magnetron sputtering under varying nitrogen flow rates. The results demonstrated that the nitrogen flow rate significantly influenced film composition, microstructure, mechanical properties, electrochemical behavior, and tribological performance. Specifically, as the nitrogen flow rate increased, the surface roughness and thickness of the films initially decreased and then increased. This trend was associated with the nitrogen partial pressure, nitrogen dissociation rate, and the phenomenon of target poisoning. At moderate nitrogen flow rates, the elevated nitrogen partial pressure reduced the flux of sputtered ions reaching the substrate surface. Although the energy enhanced surface mobility, the overall mobility was reduced, leading to larger cluster sizes and increased surface roughness. As the nitrogen flow rate further increased, protruding structures appeared on the film surface. However, the grain refinement effect induced by silicon nitride enhanced cluster densification, reducing both cluster size and surface roughness. Further increases in nitrogen flow caused the protruding structures to grow in size, resulting in a further increase in roughness. Additionally, a higher nitrogen flow rate increased the nitrogen content in the films and the proportion of MoN and MoSiNX phases, indicating an increase in metal-nitrogen covalent bonding and enhanced solid solution strengthening. Thus, both the film hardness and elastic-plasticity index improved progressively. The MoSiN-4 film exhibited the highest hardness, H = 12.96 ± 0.65 GPa, along with elastic-plasticity indices of H / E = 0.074 and H3/E2 = 0.071. Furthermore, the bonding strength of MoSiN films initially decreased and then increased, with the MoSiN-4 film achieving the highest bonding force of 6.45 N, indicating superior resistance to crack propagation and brittle spallation. Owing to the optimal combination of bonding strength, hardness, and elasticity, the MoSiN-4 film demonstrated the most favorable tribological properties, including the lowest and most stable coefficients of friction and minimal wear rates under both dry friction and Hank’s solution conditions. The wear rate of the MoSiN-4 film was (9.31 ± 1.3) × 10-5 mm3/(N·m) in dry environments and (2.96 ± 0.42) × 10-4 mm3/(N·m) in Hank’s solution. Additionally, the electrochemical properties of the MoSiN films in Hank’s solution were evaluated, revealing that the films exhibited the highest charge transfer resistance, Rct = 2.04 × 105 Ω·cm2, the lowest self-corrosion current density, Icorr = 5.56 × 10-8 A/cm2, and a stable anodic passivation region. These results indicated excellent corrosion resistance under static conditions. This study identified the optimal preparation conditions for fabricating MoSiN films with superior electrochemical and tribological properties. The influence of nitrogen flow rate on the film’s composition, microstructure, mechanical performance, electrochemical behavior, and tribological characteristics was comprehensively examined. The application of MoSiN thin films on titanium alloy surfaces effectively enhances their mechanical performance, thereby mitigating wear-related issues associated with titanium alloy implants in physiological environments and serving as a protective surface layer. These findings provide valuable reference data for future research on MoSiN-based biocompatible coatings.