高功率离子源功率对持续高功率反应磁控溅射沉积Al<sub>2</sub>O<sub>3</sub>薄膜的影响

Effect of High-power Ion Source Power on the Deposition of Al₂O₃ Films by Reactive Continuous High-power Magnetron Sputtering

ZOU Yunxiao, YANG Dongjie, LIU Liangliang, LIU Yaoyao, LI Chunwei, WU Zhongzhen

China Surface Engineering . 2025, (2): 19 -26 . DOI: 10.11933/j.issn.1007-9289.20241105001

ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

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