Effect of High-power Ion Source Power on the Deposition of Al2O3 Films by Reactive Continuous High-power Magnetron Sputtering

ZOU Yunxiao, YANG Dongjie, LIU Liangliang, LIU Yaoyao, LI Chunwei, WU Zhongzhen

China Surface Engineering ›› 2025, Vol. 38 ›› Issue (2) : 19-26.

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China Surface Engineering ›› 2025, Vol. 38 ›› Issue (2) : 19-26. DOI: 10.11933/j.issn.1007-9289.20241105001

Effect of High-power Ion Source Power on the Deposition of Al2O3 Films by Reactive Continuous High-power Magnetron Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2025, 38(2): 19-26 https://doi.org/10.11933/j.issn.1007-9289.20241105001

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ISSN 1007-9289　CN 11-3905/TG
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