抛光液中离子浓度对化学机械抛光过程的影响
林广川, 郭丹, 解国新, 潘国顺
Influence of Ionic Concentration of Slurry on Process of Chemical Mechanical Polishing
LIN Guangchuan, GUO Dan, XIE Guoxin, PAN Guoshun
中国表面工程 . 2015, (4): 54 -61 .  DOI: 10.11933/j.issn.1007-9289.2015.04.007