基体偏压对电弧离子镀TiVCrNiSi(N)高熵涂层微观结构与性能的影响
崔梦辉, 丁啸云, 吴亚雯, 程影春, 连勇, 张津
Effect of Substrate Bias on Microstructure and Properties of TiVCrNiSi(N) High-entropy Coating Deposited by Arc Ion Plating
CUI Menghui, DING Xiaoyun, WU Yawen, CHENG Yingchun, LIAN Yong, ZHANG Jin
中国表面工程
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2026, (4): 422
-433
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DOI: 10.11933/CSE2026115
