电流密度对电沉积铜膜剩余电阻率的影响∗
张帅，罗积润，王小霞，张瑞，吴质洁，冯海蛟
Effects of Current Density on Residual Resistivity Ratio of Electrodeposited Copper Films
ZHANG Shuai, LUO Jirun, WANG Xiaoxia, ZHANG Rui, WU Zhijie, FENG Haijiao
中国表面工程
.
2021, (4): 60
-66
.
DOI: 10.11933/j.issn.1007-9289.20210201001
