高功率离子源功率对持续高功率反应磁控溅射沉积Al2O3薄膜的影响
邹云霄, 杨东杰, 刘亮亮, 刘瑶瑶, 李春伟, 吴忠振
Effect of High-power Ion Source Power on the Deposition of Al2O3 Films by Reactive Continuous High-power Magnetron Sputtering
ZOU Yunxiao, YANG Dongjie, LIU Liangliang, LIU Yaoyao, LI Chunwei, WU Zhongzhen
中国表面工程
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2025, (2): 19
-26
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DOI: 10.11933/j.issn.1007-9289.20241105001
