因瓦合金纳米抛光材料去除机理的分子动力学模拟∗
王婉，周青，华东鹏，李硕，王志军，王海丰
Molecular Dynamics Simulation on the Material Removal Mechanism in the Nano-polishing Process of Invar Alloy
WANG Wan, ZHOU Qing, HUA Dongpeng, LI Shuo, WANG Zhijun, WANG Haifeng
中国表面工程
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2021, (6): 160
-167
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DOI: 10.11933/j.issn.1007-9289.20210826002
