氮气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响
吕艳红1 ,2，孔庆花1,2，吉 利1，李红轩1，刘晓红1，陈建敏1，周惠娣1
Influence of Nitrogen Flows on Properties of CrAlN Film Prepared by Mid–frequency Unbalanced Magnetron Sputtering
LV Yan–hong1,2, KONG Qing–hua1,2, JI Li1, LI Hong–xuan1, LIU Xiao–hong1, CHEN Jian–min1, ZHOU Hui–di1
中国表面工程
.
2011, (4): 7
-12
.
