
氮气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响
吕艳红1 ,2,孔庆花1,2,吉 利1,李红轩1,刘晓红1,陈建敏1,周惠娣1
中国表面工程 ›› 2011, Vol. 24 ›› Issue (4) : 7-12.
氮气流量对中频非平衡反应磁控溅射制备CrAlN薄膜性能的影响
Influence of Nitrogen Flows on Properties of CrAlN Film Prepared by Mid–frequency Unbalanced Magnetron Sputtering
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