基体偏压对高功率脉冲磁控溅射制备CrAlN薄膜性能的影响
张辉，巩春志，王晓波，张炜鑫，田修波
Effect of Substrate Bias on the Properties of Craln Films Prepared by High Power Pulsed Magnetron Sputtering
ZHANG Hui, GONG Chunzhi, WANG Xiaobo, ZHANG Weixin, TIAN Xiubo
中国表面工程
.
2022, (5): 200
-209
.
DOI: 10.11933/j.issn.1007-9289.20210623001
