高功率脉冲磁控溅射TiNb靶材等离子特性及其对薄膜性能影响
陈畅子，李延涛，曾小康，马东林，姜全新，冷永祥
Plasma Characteristics of TiNb Target and Its Effect on Film Properties by High-power Impulsed Magnetron Sputtering
CHEN Changzi, LI Yantao1, ZENG Xiaokang, MA Donglin, JIANG Quanxin, LENG Yongxiang
中国表面工程
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2022, (5): 254
-263
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DOI: 10.11933/j.issn.1007-9289.20211231001
