离子源对中频反应磁控溅射AlN薄膜结构和性能的影响
刘兰兰1,2,林松盛1,2,曾德长1,代明江2,胡芳2
Efects of Ion Source on the Structure and Properties of AlN Thin Films Deposited by MF Reactive Magnetron Sputtering
LIU Lan-lan1,2, LIN Song-sheng1,2, ZENG De-chang1, DAI Ming-jiang2, HU Fang2
中国表面工程
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2012, (6): 42
-46
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