Efects of Ion Source on the Structure and Properties of AlN Thin Films Deposited by MF Reactive Magnetron Sputtering

LIU Lan-lan1,2, LIN Song-sheng1,2, ZENG De-chang1, DAI Ming-jiang2, HU Fang2

China Surface Engineering ›› 2012, Vol. 25 ›› Issue (6) : 42-46.

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China Surface Engineering ›› 2012, Vol. 25 ›› Issue (6) : 42-46.

Efects of Ion Source on the Structure and Properties of AlN Thin Films Deposited by MF Reactive Magnetron Sputtering

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ISSN 1007-9289　CN 11-3905/TG
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