Orthogonal Analysis on Deposition Parameters of TiAlN Thin Films by Cathodic Vacuum Arc Technique

CHEN Feng–guang, SUN Li–li,Cheng Hao,KE Pei–ling,WANG Ai–ying

China Surface Engineering ›› 2011, Vol. 24 ›› Issue (2) : 41-45.

China Surface Engineering ›› 2011, Vol. 24 ›› Issue (2) : 41-45.

Orthogonal Analysis on Deposition Parameters of TiAlN Thin Films by Cathodic Vacuum Arc Technique

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2011, 24(2): 41-45

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ISSN 1007-9289　CN 11-3905/TG
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