Reactive Magnetic Sputtering MoSiCN Hard Film and Its Characterization

LV Peng–hui1, NI Hao–ming2, CUI Ping2, CHEN Jian–min3, FANG Qian–feng4

China Surface Engineering ›› 2010, Vol. 23 ›› Issue (3) : 95-101.

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PDF(957 KB)
China Surface Engineering ›› 2010, Vol. 23 ›› Issue (3) : 95-101.

Reactive Magnetic Sputtering MoSiCN Hard Film and Its Characterization

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2010, 23(3): 95-101

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ISSN 1007-9289　CN 11-3905/TG
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