Based on the principle of plasma deposition ,a low vacuum lpasma deposi tion apparatus was remade from a vacuum heat treatment furnace. The diamond-like film was deposited on monocrystalline silicon and high speed steel substrates u sing the filtered cathode arc deposition method. The results of mechanical prope rties and corrosion tests showes that the remake of new apparatus was successful , which laid afoundation for its further improvement,and the diamond-like film deposited on monocrstalline silicon is better than that on high speed steel.