Effects of Oxygen Plasma on Surface Wettability of Porous Silicon

doi:10.3969/j.issn.1007-9289.2013.05.008

JIANG Lei, LI Zhaomin, YANG Limin, LI Songyan, SUN Qian, ZHANG Dong, WANG Jiqian

China Surface Engineering ›› 2013, Vol. 26 ›› Issue (5) : 43-48.

PDF(2655 KB)

China Surface Engineering ›› 2013, Vol. 26 ›› Issue (5) : 43-48. DOI: 10.3969/j.issn.1007-9289.2013.05.008

Effects of Oxygen Plasma on Surface Wettability of Porous Silicon

{{article.zuoZhe_EN}}

Author information +

History +

HeighLight

Abstract

Key words

QR code of this article

Cite this article

EndNote

Ris (Procite)

Bibtex

Download Citations

{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2013, 26(5): 43-48 https://doi.org/10.3969/j.issn.1007-9289.2013.05.008

References

Publishing order | Descend order by publishing year | Descend order by cited within

References

Funding

RIGHTS & PERMISSIONS

PDF(2655 KB)

Accesses

Citation

Detail

Sections

Recommended

ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

Visited

Total visitors:　
Visitors of today: 　
Now online:

Please choose a citation manager

Content to export