Removal Mechanism of Single-crystal Silicon Carbide by Ultrasonic-assisted Photocatalytic Polishing

TIAN Zhuangzhi, BAN Xinxing, BA Wenlan, ZHU Jianhui, WANG Ningchang, HUI Zhen, LI Zhengxin

China Surface Engineering ›› 2025, Vol. 38 ›› Issue (5) : 171-181.

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China Surface Engineering ›› 2025, Vol. 38 ›› Issue (5) : 171-181. DOI: 10.11933/j.issn.1007-9289.20250122001

Removal Mechanism of Single-crystal Silicon Carbide by Ultrasonic-assisted Photocatalytic Polishing

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2025, 38(5): 171-181 https://doi.org/10.11933/j.issn.1007-9289.20250122001

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ISSN 1007-9289　CN 11-3905/TG
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Sponsored by: Chinese Mechanical Engineering Society
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