Effect of Target Current on the Structure and Properties of TiB<sub>2</sub> Thin Films Prepared by Magnetron Sputtering

doi:10.11933/j.issn.1007-9289.20231114002

Effect of Target Current on the Structure and Properties of TiB₂ Thin Films Prepared by Magnetron Sputtering

LENG Xiao, LI Hongxuan, JI Li, ZHANG Dingjun

China Surface Engineering ›› 2024, Vol. 37 ›› Issue (5) : 147-157.

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China Surface Engineering ›› 2024, Vol. 37 ›› Issue (5) : 147-157. DOI: 10.11933/j.issn.1007-9289.20231114002

Effect of Target Current on the Structure and Properties of TiB₂ Thin Films Prepared by Magnetron Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2024, 37(5): 147-157 https://doi.org/10.11933/j.issn.1007-9289.20231114002

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ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

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Received	Revised	Published
2023-11-14	2024-01-10	2024-10-20
Issue Date
2024-10-20

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