Deposition of Niobium-oxide Thin Films Using Electron Cyclotron Wave Resonance Plasma-Ion-Source-Assisted Medium-frequency Magnetron Sputtering

doi:10.11933/j.issn.1007-9289.20220116002

YIN Jiping, Lü Shaobo, LIN Zeng, BA Dechun

China Surface Engineering ›› 2024, Vol. 37 ›› Issue (4) : 273-279.

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China Surface Engineering ›› 2024, Vol. 37 ›› Issue (4) : 273-279. DOI: 10.11933/j.issn.1007-9289.20220116002

Deposition of Niobium-oxide Thin Films Using Electron Cyclotron Wave Resonance Plasma-Ion-Source-Assisted Medium-frequency Magnetron Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2024, 37(4): 273-279 https://doi.org/10.11933/j.issn.1007-9289.20220116002

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ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

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Received	Revised	Published
2022-01-16	2023-07-15	2024-08-20
Issue Date
2024-08-20

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