Research Progress on Optoelectronic Thin Films Deposited by HiPIMS: Discharge Characteristics and Parameter Adjustment

doi:10.11933/j.issn.1007-9289.20211231004

ZHANG Haibao, LIU Yang, CHEN Qiang

China Surface Engineering ›› 2022, Vol. 35 ›› Issue (5) : 93-104.

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China Surface Engineering ›› 2022, Vol. 35 ›› Issue (5) : 93-104. DOI: 10.11933/j.issn.1007-9289.20211231004

Research Progress on Optoelectronic Thin Films Deposited by HiPIMS: Discharge Characteristics and Parameter Adjustment

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2022, 35(5): 93-104 https://doi.org/10.11933/j.issn.1007-9289.20211231004

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ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

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