Plasma Characteristics of TiNb Target and Its Effect on Film Properties by High-power Impulsed Magnetron Sputtering

doi:10.11933/j.issn.1007-9289.20211231001

CHEN Changzi, LI Yantao^{1, ZENG Xiaokang, MA Donglin, JIANG Quanxin, LENG Yongxiang}

China Surface Engineering ›› 2022, Vol. 35 ›› Issue (5) : 254-263.

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China Surface Engineering ›› 2022, Vol. 35 ›› Issue (5) : 254-263. DOI: 10.11933/j.issn.1007-9289.20211231001

Plasma Characteristics of TiNb Target and Its Effect on Film Properties by High-power Impulsed Magnetron Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2022, 35(5): 254-263 https://doi.org/10.11933/j.issn.1007-9289.20211231001

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ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

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