Effects of Pulse Bias on Structure and Properties of MoN Film Deposited by DC Magnetron Sputtering

doi:10.11933/j.issn.1007-9289.20181106003

XU Xing, SU Fenghua and LI Zhujun

China Surface Engineering ›› 2019, Vol. 32 ›› Issue (2) : 54-62.

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China Surface Engineering ›› 2019, Vol. 32 ›› Issue (2) : 54-62. DOI: 10.11933/j.issn.1007-9289.20181106003

Effects of Pulse Bias on Structure and Properties of MoN Film Deposited by DC Magnetron Sputtering

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2019, 32(2): 54-62 https://doi.org/10.11933/j.issn.1007-9289.20181106003

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ISSN 1007-9289　CN 11-3905/TG
Supervised by: China Association for Science and Technology
Sponsored by: Chinese Mechanical Engineering Society
Edited and Published by: Editorial Office of China Surface Engineering

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