Rapid Deposition of Al2O3 Films by HiPIMS Assisted by Ion Source

YANG Dongjie, AN Xiaokai, LIU Yaoyao, LÜ Wei, LUO Wanli, YU Qinfang, WU Min, CUI Suihan, LIU Liangliang, WU Zhongzhen

China Surface Engineering ›› 2026, Vol. 39 ›› Issue (2) : 365-373.

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China Surface Engineering ›› 2026, Vol. 39 ›› Issue (2) : 365-373. DOI: 10.11933/CSE2026057

Rapid Deposition of Al2O3 Films by HiPIMS Assisted by Ion Source

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{{article.zuoZheEn_L}}. {{article.title_en}}[J]. {{journal.qiKanMingCheng_EN}}, 2026, 39(2): 365-373 https://doi.org/10.11933/CSE2026057

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