集成电路化学机械抛光终点检测技术研究进展
赵光恩, 王成鑫, 陈剑雄, 黄煜华, 黄若辰
Advances in Chemical Mechanical Polishing Endpoint Detection Technology for Integrated Circuits Manufacturing
ZHAO Guangen, WANG Chengxin, CHEN Jianxiong, HUANG Yuhua, HUANG Ruochen
中国表面工程
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2025, (5): 83
-98
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DOI: 10.11933/j.issn.1007-9289.20241202001
