常压下MOCVD法制备Al2O3薄膜工艺的研究
罗小秋,温吉利,刘炯,孙启凤
Study on the Preparation of Al2O3 Film by MOCVD Under Normal Atmosphere
LUO Xiao-qiu,WEN Ji-li,LIU Jiong,SUN Qi-feng
中国表面工程 . 2007, (3): 47 -50 .