| 摘要: |
| 为获得耐蚀性较好的NiSnP镀层及其最佳镀液配方，利用正交试验方法设计了9种不同的镀液组分，利用化学镀技术在L245低碳钢上镀制了高Sn含量的NiSnP三元镀层。采用扫描电子显微镜和X射线衍射仪对镀层的成分、结构以及镀速进行分析，并采用盐雾腐蚀实验评价镀层的耐蚀效果。结果表明： 高Sn含量的NiSnP镀层组织以非晶态结构为主，表面形态为典型的胞状结构。当乳酸和硫酸镍为较低浓度，氯化锡和柠檬酸钠为高浓度时，NiSnP镀层的形核率较高，镀层表面形貌较好。镀液中柠檬酸钠和硫酸镍对镀层的沉积过程有利，浓度越大，镀层沉积越快，而乳酸对镀层的沉积不利。35 g/L硫酸镍、35 g/L氯化锡、25 g/L柠檬酸钠和40 mL/L乳酸为最佳镀液组分，在该条件下获得的NiSnP镀层耐蚀效果最好。 |
| 关键词: 化学镀 NiSnP镀层 镀液 显微组织 镀速 |
| DOI：10.3969/j.issn.1007-9289.2014.04.008 |
| 分类号: |
| 基金项目: |
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| Effects of Compositions in Plating Solution on the Structure and Deposition Rate of Ni-Sn-P Coatings with High Sn Content |
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FAN Hongyuan, XIAN Guang, GUI Yanhua, GU Tan, WANG Jun, WU Hua1,2
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1.School of Manufacture Science and Engineering, Sichuan University, Chengdu 610065;2.Research Institute of Natural Gas Technology, PetroChina Southwest Oil & Gasfield Co., Chengdu 610213
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| Abstract: |
| To obtain the better corrosion resistance NiSnP coating and its plating solution, electroless NiSnP ternary coatings with high tin content were deposited on L245 steel substrate in nine different constitutes in plating bath that were designed on the basis of orthogonal experiment method. The concentration, structure and deposition rate of NiSnP coatings were evaluated by scanning electron microscopy and Xray diffraction technique. The saltspray corrosion test was used to evaluate the corrosion resistance of the asdeposited NiSnP coatings. The results show that the structure of NiSnP ternary coatings with high tin content mainly exhibited the amorphous state. The surface morphology of NiSnP coatings exhibites typically spherical nodular structure. When the concentration of C3H6O3 and NiSO4 is relatively low, and the concentration of SnCl4 and C6H5O7Na3·2H2O were relatively high, the nucleation rate of NiSnP coatings is rather high, and the surface quality is better. The C6H5O7Na3·2H2O agent and NiSO4 salt are helpful for the growth of coatings, while C3H6O3 agent is harmful to the deposition. The best plating solution consists of NiSO4 of 35 g/L, SnCl4 of 35 g/L, C6H5O7Na3·2H2O agent of 25 g/L and C3H6O3 agent of 40 ml/L, in which the NiSnP coating deposited exhibites the best corrosion resistance. |
| Key words: electronless plating NiSnP coating plating solution microstructure deposition rate |
