| 摘要: |
| 等离子体浸没离子注入与沉积技术可实现复杂形状零件表面垂直、均匀地离子注入与沉积处理，在材料表面改性领域具有广泛的应用前景。在技术发明后的20年间，该技术得到了快速的发展，但是也遇到了如何提高离子注入效率和注入均匀性、内表面注入、大面积注入等一系列问题。若上述问题得到解决，将极大的推进等离子体浸没离子注入与沉积技术的工业应用进程。 |
| 关键词: 等离子体浸没离子注入与沉积 表面改性 发展 |
| DOI： |
| 分类号: |
| 基金项目:国家自然科学基金项目(10875033) |
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| The Development and Key Problems of Plasma Immersion Ion Implantation and Deposition |
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WANG Lang–ping, WANG Xiao–feng, TANG Bao–yin
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State Key Laboratory of Advanced Welding Production Technology, Harbin Institute of Technology, Harbin 15000
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| Abstract: |
| Plasma Immersion Ion Implantation and Deposition technology (PIIID) can obtain a uniform and perpendicular ion implantation on the components with sophisticated shape. It has shown great potential in surface modification for industrial components. After its invention, PIIID has developed rapidly in recent years. However, in order to get wide commercial applications, the methods for high efficiency ion implantation, inner surface ion implantation and large area ion implantation should be proposed. |
| Key words: plasma immersion ion implantation and deposition surface modification development |
