| 摘要: |
| 以四靶闭合场非平衡磁控溅射方法制备C/Cr镀层，用球痕法测量镀层厚度，研究了镀层厚度及均匀性随靶基距的变化规律，并探讨了靶基距影响镀层厚度的机理。结果表明：靶基距对镀层厚度有明显影响；镀层厚度随靶基径向距增大而显著减小，随靶基轴向距的增加变化不大；试样放置位置越靠近真空室中心区域，镀层厚度均匀性越好；磁场空间分布和粒子迁移中的散射碰撞是导致靶基距影响镀层厚度的主要原因。 |
| 关键词: 非平衡磁控溅射 C/Cr镀层 靶基距 厚度 |
| DOI： |
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| 基金项目:*国家高技术研究发展计划(863计划)，闭合场非平衡磁控溅射离子镀镀膜装备的研究开发（2005AA33H010） |
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| The Study About Effect of Substrate-to-target Distance on the Thickness of C/Cr Composite Coatings |
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DENG Ling-chao, LUAN Ya, ZHANG Guo-jun, JIANG Bai-ling
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School of Materials Science and Engineering, Xi’an University of Technology, Xi’an 710048 China
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| Abstract: |
| The effect of substrate-to-target distance on the thickness of carbon/chromium coating uaually occurred when the coating was deposited by a Teer UDP450 unbalanced magnetron sputtering deposition system. The thickness of the coatings was measured by a Teer BC-1 ball crater device. The relation between thickness of coating and substrate-to-target distance was investigated, and the mechanism about the effect of substrate-to-target distance on the thickness of coating was discussed. The results indicated that substrate-to-target distance shows a great effect on the thickness of C/Cr coating, the thickness of coatings is decreased obviously with the increase of substrate-to-target radial distance and has a little change with the increase of substrate-to-target axial distance, the uniformity of thickness of C/Cr coating can be improved gradually when the substrate-placed position is close to central area of working chamber. The dominant factors causing the effect of substrate-to-target distance on the thickness of coating are the |
| Key words: unbalanced magnetron sputtering C/Cr coatings substrate-to-target distance thickness |
