| 摘要: |
| 分析了电弧离子镀（AIP）TiN薄膜中的主要缺陷－熔滴、孔洞和疏松等。结果表明：这些缺陷存在于晶内、晶界或者贯穿于整个薄膜；缺陷的存在极大地影响了薄膜的性能；缺陷密度与镀膜方法及具体的工艺参数有密切关系；使用磁过滤器镀制薄膜可显著减少上述缺陷，从而提高薄膜的各种性能。认为使用磁过滤器镀制TiN及其各种复合或多层薄膜是一种切实有效的方法，是今后制备高性能TiN及其复合膜的发展方向，另外，缩短脉冲电弧在高值时的时间，用人工来减少薄膜缺陷也是一种行之有效的方法。 |
| 关键词: 电弧离子镀 TiN薄膜 缺陷 磁过滤器 |
| DOI： |
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| 基金项目:*广东省科技攻关计划项目资助（资助号102－B26650）；广东省自然科学基金重点项目资助（资助号116－B65130） |
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| Defects in TiN Films Prepared by Arc Ion Plating and Their Formation Reasons |
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SHI Xin-wei，QIU Wan-qi，LIU Zheng-yi
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1. Key Laboratory of Material Physics of Ministry of Education, Zhengzhou University, Zhengzhou 450052， 2.College of Mechanical engineering, South Chian University of Technology, Guangzhou 510641
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| Abstract: |
| The defects of TiN films prepared by arc ion plating technique, like molten droplets, micropores, and porosity, are analyzed in this paper. The results show that these defects exist in crystal grains, on grain boundaries or throughout the whole film; These defects greatly affect the films' properties; The density of defects is related with the preparing technology and the specific deposition conditions. The application of magnetic filter can significantly reduce the above defects, so the properties of the films can be enhanced. Using the magnetic filter to deposit TiN films or multi-layered films is really a very good method, it can be considered a developing derection of preparing TiN films with good properties. In addition, shortening the time of pulsed arc at high value is another good way to reduce the defects of film. |
| Key words: arc ion plating TiN thin film defect magnetic filter |
