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脉冲电压对内花键齿Si-DLC薄膜微观结构及性能的影响
徐天杨1,2,3, 詹华1,2, 张艳静1, 吴佳亿1, 汪瑞军1
1.中国农业机械化科学研究院 北京 100083;2.哈尔滨工业大学先进焊接与连接国家重点实验室 哈尔滨 150001;3.北京金轮坤天特种机械有限公司 北京 100083
摘要:
为提高花键齿表面硬度和耐磨性,利用空心阴极放电(HCD)产生的高密度等离子体,在内花键齿表面,采用等离子体增强化学气相沉积(PECVD)技术制备 Si-DLC 薄膜,并研究脉冲电压变化对花键齿表面 Si-DLC 薄膜微观结构及性能的影响。结果表明:拉曼光谱显示增加脉冲电压可以减少 Si-DLC 薄膜中的 sp3 杂化键含量。随着脉冲电压增加,键齿表面 Si-DLC 薄膜厚度和沉积速率先增加后降低,在脉冲电压为?1 100 V 时达到最大。在相同的脉冲电压条件下,花键齿顶处 Si-DLC 薄膜的厚度最大,齿中处 Si-DLC 薄膜厚度最小。Si-DLC 薄膜的显微硬度随着脉冲电压的升高逐渐降低,硬度可达 800~1 300 HV0.025。Si-DLC 薄膜能显著降低花键齿的摩擦因数,且脉冲电压为?900 V 时,制备的 Si-DLC 薄膜有着最优的减摩效果,沿花键齿廓方向上的 Si-DLC 薄膜的摩擦因数均小于 0.1。Si-DLC 薄膜的制备提高了花键齿表面的硬度和耐磨性,为其他机械传动部件表面耐磨薄膜的制备奠定了基础。
关键词:  内花键齿  Si-DLC 薄膜  力学性能  摩擦学性能
DOI:10.11933/j.issn.1007?9289.20211223002
分类号:TG156;TB114
基金项目:先进焊接与连接国家重点实验室开放课题研究基金资助项目(AWJ-21M14)
Effects of Pulse Voltage on Microstructure and Properties for Si-DLC Films on Internal Spline Tooth
XU Tianyang1,2,3, ZHAN Hua1,2, ZHANG Yanjing1, WU Jiayi1, WANG Ruijun1
1.Chinese Academy of Agricultural Mechanization Sciences, Beijing 100083 , China;2.State Key Lab of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001 , China;3.Beijing Golden Wheel Special Machine Co., Ltd, Beijing 100083 , China
Abstract:
To improve the hardness and wear resistance of spline tooth, Si-DLC films are prepared on internal spline tooth by plasma enhanced chemical vapor deposition(PECVD), utilizing high-density hollow cathode discharge (HCD) plasma. Microstructure and properties of Si-DLC films coated internal spline tooth are analyzed, which utilizes plasma ignited by various pulse voltage. Raman spectra results show that the increase of pulse voltage could reduce the content of sp3 hybrid in Si-DLC films. The film’ s thickness and deposition rate increase first and then decrease with the increasing pulse voltage, both reach the highest value at ?1 100 V. Si-DLC films on tooth top and tooth middle, which deposited by the same pulse voltage, have the highest and least thickness, respectively. The microhardness of Si-DLC films decreases with increasing pulse voltage, which is in the range of 800-1 300HV0.025. Si-DLC films can decline the friction coefficient of spline tooth dramatically, and Si-DLC films deposited with a pulse voltage of ?900 V has the most optimized friction-reduction effect, which friction coefficient of Si-DLC films along tooth profile are less than 0.1. Si-DLC films enhance the hardness and wear resistance of spline, which provides the basis of wear-resistant coatings preparation for other mechanical transition parts.
Key words:  internal spline tooth  Si-DLC films  mechanical properties  tribological properties