| 摘要: |
| 金属材料抗反射表面在太阳能电池、光电子产品和军事隐身等领域具有广泛应用,制备微结构的金属抗反射表面具有极大地挑战性,通常这种结构是通过相当复杂和耗时的技术制备。 超快激光微加工技术刻蚀的微纳抗反射结构具有可控、稳定、环保且单步制备等特点,已成为近年来的研究热点。 梳理抗反射表面的理论模型及影响因素,概述国内外超快激光刻蚀抗反射表面的结构类型,提出未来超快激光制备金属微纳结构可能在太阳能电池的开发和利用、军事隐身及环保产品的应用等领域得到应用。 最后,总结超快激光刻蚀制备抗反射微纳结构表面存在的问题,并对超快激光加工微纳结构抗反射多功能表面的应用前景进行展望。 结果表明:超快激光在金属表面织构能够制备纳米、微米和微纳混合多种类型的微纳结构,实现了金属表面多种波段的超宽波谱的低反射率。 随着波长的增加,具有微纳米结构的金属表面的反射率比具有相对光滑结构的金属表面的反射率增加得更慢。 对超快激光制备金属抗反射表面在各领域的应用研究有一定的理论依据与参考意义。 |
| 关键词: 抗反射表面 金属 超快激光 微米结构 纳米结构 微纳结构 |
| DOI：10.11933/j.issn.1007-9289.20210723001 |
| 分类号:TG141;TG177;TG178 |
| 基金项目:国家自然科学基金(51775554,51535011,52005511)；清华大学摩擦学国家重点实验室开放基金(SKLTKF20B10)资助项目 |
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| Research Progress of Antireflective Metal Surfaces Prepared by Ultrafast Laser |
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LÜ Xiaoren1, ZHONG Bing1,2, HUANG Yanfei2,3, XING Zhiguo2, GUO Weiling2
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1.School of Mechanical Engineering, Shenyang University of Technology, Shenyang 110870 , China;2.National Key Laboratory for Remanufacturing, Army Academy of Armored Forces, Beijing 100072 , China;3.State Key Laboratory of Tribology, Tsinghua University, Beijing 100084 , China
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| Abstract: |
| Due to the wide application of metal anti-reflective surface in solar cells, photoelectric products, military stealth and other aspects, the preparation of microstructure metal anti-reflective surface is extremely challenging. Generally, this structure is prepared by a rather complex and time-consuming techniques. The micro-nano anti-reflective structure etched by ultrafast laser micromachining technology has the characteristics of controllability, stability, environmental friendliness and one-step preparation, which has become a research focus. The theoretical model of anti-reflective surface and its influencing factors are combed, and the structure types of antireflective surface etched by ultrafast laser are summarized. The metal micro-nano structures prepared by ultrafast laser may be used in the development and utilization of solar cells, military stealth and application of environmental protection products in the future. Finally, the problems existing in the preparation of anti-reflection micro-nano structure surface by ultra-fast laser etching are summarized, and the application prospects of ultra-fast laser processing of anti-reflection multifunctional surface of micro-nano structure is prospected. The results show that various types of micro-nano structures can be prepared by ultrafast laser texture on the metal surface, and ultra-wide spectrum and low reflectivity of metal surface in various wave bands can be achieved. As the increase of wavelength, the increase rate of the reflectivity is faster; as the increase of wavelength, the reflectivity of a metal surface with micro-nano structures increases more slowly than that of metal surface with relatively smooth structure. The application of ultrafast laser to prepare metal anti-reflective surface in various fields provides a certain theoretical basis and reference significance. |
| Key words: anti-reflective surface metal ultrafast laser micro structure nano-structure micro-nano structure |
