| 摘要: |
| 采用磁过滤阴极真空弧沉积(FCVAD)与磁控溅射(MS)两种技术在玻璃上制备厚度分别为75 nm和165 nm的Glass/Al高反射薄膜,利用Lambda 950分光光度计、扫描电子显微镜、原子力显微镜、附着力测试仪、摩擦试验机和加速老化试验箱分别表征薄膜的反射率、表面形貌、粗糙度、附着力、耐摩擦和耐老化性能,通过薄膜性能评估分析两种技术制备高反射膜性能的差异。结果表明:在双方优化工艺下,FCVAD制备的薄膜表面形貌和附着力优于MS薄膜;FCVAD制备的75 nm和165 nm薄膜反射率比同厚度MS薄膜高出3.3%~4.2%;75 nm厚的薄膜方均根粗糙度明显小于同厚度的MS薄膜;FCVAD制备的75 nm薄膜老化后反射率仅下降1.2%,而MS同厚度薄膜反射率下降了3.3%~4%。说明FCVAD在制备高反射膜方面比磁控溅射更有优势。 |
| 关键词: 光学薄膜 物理气相沉积 磁过滤阴极真空弧沉积 磁控溅射 高反射膜 |
| DOI：10.11933/j.issn.1007-9289.2016.03.005 |
| 分类号: |
| 基金项目: |
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| Influences of Preparation Technologies on Properties of Solar High Reflection Thin Films |
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LI Hai-bing1, XU Yong-jun2, CAI Qi-wen2, TU Wei-ping1, LIAO Jun-xu2
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1.School of Chemistry and Chemical Engineering, South China University of Technology, Guangzhou 510640;2.Energy and Chemical Engineering, Dongguan University of Technology, Dongguan 523808, Guangdong
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| Abstract: |
| Glass/Al high reflective films with the thickness of 75 nm and 165 nm were prepared on glass substrates by using filter cathode vacuum arc deposition(FCVAD) and magnetron sputtering(MS). The reflectivity of thin films, surface morphologies and roughness, adhesion,wear resistance and aging resistance were analyzed by Lambda 950 UV/Vis/NIR spectrophotometer, SEM, AFM, adhesion tester, friction testing machine and aging test box, respectively. The differences of the two techniques in the preparation of high reflective films were analyzed by thin film properties. Under the optimized conditions, the results indicate that the adhesion and density of Al films prepared by FCVAD are better than that by MS. The reflectivity of 75 nm and 165 nm films by FCVAD is higher than the films with the same thickness of 3.3%-4.2%. The root mean square roughness of 75 nm film by FCVAD is significantly less than that film with the same thickness by MS. The reflectivity after aging of 75 nm film only decreases by 1.2%, while the reflectivity of the film by MS decreases by 3.3%-4%. FCVAD is much better than MS in the preparation of high reflective films. |
| Key words: optical thin film physical vapor deposition(PVD) magnetic filter cathode vacuum arc deposition(FCVAD) magnetron sputtering(MS) high-reflecting film |
