摘要: |
为了在T10A钢表面得到厚度薄且孔隙率较低的化学镀镍层,运用单因素分析法,考察了施镀温度、施镀时间、硫酸镍质量浓度和次磷酸钠质量浓度对化学镀镍层厚度及孔隙率的影响,并初步得到各因素指标的适宜浓度范围。在此基础上,通过正交试验法,确定了化学镀镍的最优工艺配方:硫酸镍25 g/L,次磷酸钠25 g/L,醋酸钠25 g/L,辅助配位剂25 g/L,光亮剂2 g/L,硫脲2 mg/L,pH=4.0,施镀温度70 ℃,施镀时间10 min。正交试验的极差分析表明:在施镀温度、施镀时间、硫酸镍质量浓度和次磷酸钠质量浓度4个因素指标中,硫酸镍质量浓度对于镀层厚度、孔隙率及镀层显微硬度的影响都最大;且采用该化学镀镍配方,可获得孔隙率为12 点/cm2,镀层厚度为4.1 μm及镀层显微硬度为487 HV0.1的镀层。 |
关键词: T10A钢 化学镀镍 镀层厚度 孔隙率 正交试验 |
DOI:10.3969/j.issn.1007-9289.2013.06.011 |
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Electroless Nickel Plating on T10A Steel |
BAO Yuwei, FAN Jinhui, ZHU Shigen
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College of Mechanical Engineering, Donghua University, Shanghai 201620
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Abstract: |
To obtain slight and low porosity eletroless nickel coating on T10A, the effects of temperature, time, nickel sulfate, and sodium hypophosphite on thickness of the coating and porosity rate were studied using singlefactor tests. The pleasant range of influencing factors was first obtained. Through orthogonal experimental design, an optimal bath formulation for electroless nickel plating was then determined as follows: nickel sulfate 25 g/L, sodium hypophosphite 25 g/L, sodium acetate 35 g/L, auxiliary complexformer agent 30 g/L, polish 2 g/L, sulfocarbamide 2 mg/L, pH 4.0 and temperature 70 ℃. The results show that the concentration of significantly influenced the thickness of the coating, porosity rate and hardness; the electrolessnickelplating with the porosity of 12 points per cm2, thickness of 4.1 μm and hardness of 487 HV0.1 can be obtained. |
Key words: T10A electroless nickel plating thickness of coating porosity orthogonal experimental design |