摘要: |
MoSiCN纳米复合薄膜于100 V负偏压下使用反应磁控溅射法被沉积在硅和不锈钢基体上,其结构和力学性能使用XRD、XPS、TGA、纳米压痕仪、摩擦试验机等测试与表征.测试结果表明薄膜硬度为30 GPa;薄膜由MoCN纳米晶粒镶嵌在非晶SiCN基体中,Si含量与纳米复合薄膜的结构密切相关;摩擦因数比MoCN薄膜有很大降低,分析认为纳米C颗粒进入MoSiN晶界中所起的润滑作用使然;薄膜抗氧化温度为1 100 ℃左右,盐雾试验显示薄膜抗腐蚀时间超过150 h,经思考认为是薄膜组成中金属Mo的含量减少,大量SiCN陶瓷组分提高了薄膜的抗氧化和抗腐蚀性能. |
关键词: 纳米复合 纳米晶MoN/非晶SiCNX MoSiCN 薄膜 抗氧化性 摩擦因数 |
DOI: |
分类号: |
基金项目: |
|
Reactive Magnetic Sputtering MoSiCN Hard Film and Its Characterization |
LV Peng–hui, NI Hao–ming, CUI Ping, CHEN Jian–min, FANG Qian–feng1,2,3,4
|
1. Wuhan Branch of National Sciences Library, Chinese Academy of Sciences, Wuhan 430071;2. Ningbo Institute of Materials Technology and Engineering, Chinese Academy of Sciences Ningbo, Zhejiang Hangzhou 315201;3. Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences Lanzhou, Lanzhou 730000;4. Institute of Solid State Physics, Chinese Academy of Sciences, Hefei, Anhui 230031
|
Abstract: |
MoSiCN films were deposited on the silicon and stainless steel wafers by reactive magnetron sputtering under a bias voltage of ?100 V. The structures and mechanical properties of the MoSiCN films were investigated by XRD, XPS, TGA and Nano–indenter, scratch test. It was found that Si contents were closely correlated to the structures of the nanocomposite films. We have found that nanocomposite coatings are composed of nanocrystalline MoCNx in a matrix of amorphous SiCN. The hardness of as–deposited films exhibits a maximum hardness at 30 GPa, as evaluated by nanoindentor XP. The oxidation resistance temperature of the film is about 1100 ℃, according to the TGA measurements. Salt spray test of the MoSiCN coatings was also carried out, which exhibited a corrosion time of over 150 h. |
Key words: nanocomposite nc–MoN/a–SiCNx MoSiCN Films oxidation resistance friction coefficient |