| 摘要: |
| 采用镶嵌靶反应磁控溅射技术，通过调节氮分压及基体偏压在M2高速钢基体表面制备了一系列耐热的 (Ti,Al)N硬质薄膜，并用XRD，EDS及纳米压入法、划痕法等方法研究了(Ti, Al)N薄膜的成分、相结构与力学性能的关系。结果表明，氮分压和基体偏压对(Ti, Al)N薄膜取向及Ti、Al、N原子含量有明显影响，从而导致薄膜硬度及膜基结合性能发生变化。研究中，在氮分压为33.3×10-3 Pa、基体偏压为?100 V时制备的(Ti, Al)N薄膜力学性能最优，其纳米硬度为43.4 GPa，达到40 GPa超硬薄膜的要求。 |
| 关键词: (Ti,Al)N薄膜 磁控溅射 氮分压 基体偏压 力学性能 |
| DOI： |
| 分类号: |
| 基金项目: |
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| Mechanical Properties of (Ti,Al)N Films Deposited by Reactive Magnetron Sputtering |
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ZHOU Tao, NIE Pu–lin, LI Zhu–guo, HUANG Jian, CAI Xun
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Shanghai Key Laboratory of Materials Laser Processing and Modification, Shanghai Jiao Tong University, shanghai 200240
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| Abstract: |
| The (Ti,Al)N films were deposited by direct current (DC) reactive magnetron sputtering using Ti–Al mosaic target on M2 high speed steel. In the deposition, the nitrogen partial pressure and substrate bias were adjusted for optimizing the deposition process and obtaining good mechanical properties. The composites, structures and mechanical properties of the deposited films were investigated using XRD, EDS, nanoindentation and scratch tests. The results show that the nitrogen partial pressure and substrate bias influence the orientation and composition (Ti, Al and N atoms) of the film. Therefore the hardness and interfacial adhesion of the films are influenced by the deposition details. In this study, the highest hardness of the film was 43.4 GPa, which was obtained in the process of 33.3×10-3 Pa N2 partial pressure and ?100 V bias voltage. The value satisfies the standard of super–hard films (>40 GPa). |
| Key words: (Ti,Al)N film magnetron sputtering N_2 partial pressure substrate bias mechanical properties |
