| 摘要: |
| 将非平衡磁控溅射和电弧离子镀工艺相结合，并使用霍尔离子源辅助，制备了过渡层为Cr、掺杂Ti和N的DLC薄膜。对DLC薄膜的表面形貌、内部结构、力学性能以及电学性能进行了分析测试，结果表明：膜层中含有sp2 键和sp3键结构，硬度达到HV（20g）2600以上，摩擦因数接近0．1，电阻高于2MΩ。 |
| 关键词: 硬质膜 非平衡磁控溅射 电弧离子镀 霍尔离子源 |
| DOI： |
| 分类号: |
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| The Properties of DLC Hard Film Prepared by Combining Unbalanced Magnetron Sputtering with Arc Plating |
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YU Da-yang , MA Sheng-ge, ZHANG Yi-chen , XU Lu1,2
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1. College of Mechanical Engineering, Northeastern University, Shenyang 10004;2.National R&D center for surface engineering of China, Shenzhen 518029 China
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| Abstract: |
| The combined unbalanced magnetron sputtering with arc plating assisted by Hall ion source was adopted to prepare Ti and N doped DLC film with a transition layer of Cr. The surface topology, microstructure, mechanical and electronic properties of DLC film were analysed. The results showed that the film contains sp2 and sp3 bonds. Its hardness is more than Hv(20g)2600. The friction coefficient near 0.1 and the electric resistance is over 2 MΩ. |
| Key words: hard film DLC unbalanced magnetron sputtering cathode arc hall ion source |
