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低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能比较
白秀琴,李 健1,2
1.武汉材料保护研究所,湖北 武汉 430030;2. 武汉理工大学 可靠性工程研究所,湖北 武汉 430063
摘要:
采用低温磁控溅射和普通多弧离子镀分别在冷作模具钢基体上制备了TiN 薄膜,用纳米压痕法测量了薄膜的表面硬度,并比较了低温磁控溅射与普通多弧离子镀TiN薄膜的摩擦学性能。试验表明,低温磁控溅射TiN薄膜具有与普通多弧离子镀TiN薄膜相近的表面硬度,在多种试验条件下,低温磁控溅射TiN薄膜都有较好的摩擦学性能,摩擦副的磨损率低,摩擦因数小且变化平稳,磨损表面光滑。
关键词:  低温磁控溅射  多弧离子镀  TiN薄膜  摩擦学性能
DOI:
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基金项目:
A Comparison of the Tribological Properties Between Low Temperature Magnetic Sputtering and Multi-arc Ion Plating TiN Films
BAI Xiu-qin , LI Jian 1,2
1. Wuhan Research Institute of Materials Protection, Wuhan 430030, China;2. Reliability Engineering Institute, Wuhan University of Technology, Wuhan 430063, China
Abstract:
This paper focused on the preparation of TiN films on ASSAB DF-2 substrate using low-temperature magnetic sputtering technique and multi-arc ion plating technique respectively. Nano-indentation tests were performed to measure the surface hardness of the films using different techniques. A comparative analysis of tribological properties was made for the TiN films prepared by two techniques. The analysis results showed that the TiN films by different techniques had the similar surface hardness. Under different testing conditions, the TiN film prepared by low-temperature magnetic sputtering technique exhibited better tribological properties, lower wear rate, smaller and steadier friction coefficient and smoother wear surface than the TiN film using multi-arc ion plating technique.
Key words:  low temperature magnetic sputtering  multi-arc ion plating  TiN films  tribological properties