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| 摘要: |
| 对纯钛表面在不同电压下制备了等离子体氧化膜，采用声发射监控的划痕法研究了等离子体氧化膜的临界载荷Lc。形貌和成分分析显示随着电压的升高试样表面的放电气孔孔径尺寸变大，同时在高电压下出现少量的CaTiO3；划痕试验表明临界载荷Lc随电压的升高而降低。 |
| 关键词: 等离子体氧化 划痕法 临界载荷 |
| DOI： |
| 分类号:R318.08 |
| 基金项目:国家自然科学基金面上项目(50002008),863项目(2002AA326070),陕西省攻关计划重点项目(2000K-G1) |
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| Preparation and Scratch Behavior of Plasma Oxidation Film on Titanium |
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HUANG Ping XU Ke-wei HAN Yong
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| Abstract: |
| Titanium dioxide films on titanium were prepared by plasma oxidation method under different voltages. The critical load (Lc) was measured by scratch test with acoustic emission sensor. The analysis of morphology and composition showed that the size of discharge pores increased with the increase of voltage, and CaTiO3 appeared at high voltage. The scratch test indicated that the critical load (Lc) decreased with the increase of voltage. |
| Key words: plasma oxidation,scratch test,critical load |
