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| 摘要: |
| 根据等离子沉积的原理，将原真空热处理炉改造成低压真空等离子沉积装置，采用过滤式阴极电孤沉积法分别在单晶硅和高速钢这两种基体上沉积出类金刚石膜。对所沉积的膜进行了机械性能和防腐蚀性能的试验。结果表明①这一装置的改造取得了初步成功，为今后进一步改进和优化打下了基础；②运用该装置在单晶硅基体上所沉积的类金刚石膜要比在高速钢基体上所沉积的类金刚石膜性能好。 |
| 关键词: 真空电弧沉积 PVD 类金刚石膜 |
| DOI： |
| 分类号:TF132 O462.21 |
| 基金项目: |
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| Diamond-like Film produced by Vacuum Arc Deposition |
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Yuan Anfu WangMin
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| Abstract: |
| Based on the principle of plasma deposition ,a low vacuum lpasma deposi tion apparatus was remade from a vacuum heat treatment furnace. The diamond-like film was deposited on monocrystalline silicon and high speed steel substrates u sing the filtered cathode arc deposition method. The results of mechanical prope rties and corrosion tests showes that the remake of new apparatus was successful , which laid afoundation for its further improvement,and the diamond-like film deposited on monocrstalline silicon is better than that on high speed steel. |
| Key words: Vacuum Arc Depositsion,PVD,Diamond-like Film, |
