| 引用本文: | 高凯晨,巩春志,徐啸尘,田修波.高引燃脉冲新HiPIMS模式对TiN/CrN多层膜结构和性能的影响[J].中国表面工程,2022,35(5):145~154 |
| GAO Kaichen,GNOG Chunzhi,XU Xiaochen,TIAN Xiubo.Effect of New HiPIMS Mode with High Ignition Pulse on Structure and Properties of TiN / CrN Multilayers[J].China Surface Engineering,2022,35(5):145~154 |
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| 摘要: |
| 多层 TiN / CrN 薄膜能显著改善复杂环境下部件的性能和寿命，为获得性能良好的 TiN / CrN 多膜层，提出一种高引燃脉冲新 HiPIMS 模式(高功率脉冲磁控溅射技术)的新放电技术，在一到四引燃脉冲个数条件下制备 TiN / CrN 多层薄膜。 结果表明，随着引燃脉冲个数的增加，TiN / CrN 薄膜膜基结合力增加，三引燃脉冲条件下结合力达到 HF1(压痕法结合力指标，HF1 为性能良好)压痕边缘膜层出现碎裂但膜层并未崩裂，在四引燃脉冲条件下膜基结合力也为 HF1，且相较三引燃脉冲膜层碎裂也消失，膜基结合力最佳。同时，随着引燃脉冲个数的增加，膜层的粗糙度下降，磨痕变窄，硬度增强，硬度的波动范围减小，薄膜摩擦因数逐渐降低，四引燃脉冲条件下摩擦因数为 0.25，膜层厚度呈先增加后减小的趋势，在三引燃脉冲个数条件下达到最大值 332.1 nm 试验结果表明引燃脉冲能够强化膜层与基体之间的结合力，硬度以及摩擦磨损的性能，细化晶粒。 |
| 关键词: TiN / CrN 多膜层 高功率脉冲磁控溅射技术 高引燃脉冲 引燃脉冲个数 结合力 |
| DOI：10.11933/j.issn.1007?9289.20211231002 |
| 分类号:TG156;TB114 |
| 基金项目: |
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| Effect of New HiPIMS Mode with High Ignition Pulse on Structure and Properties of TiN / CrN Multilayers |
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GAO Kaichen, GNOG Chunzhi, XU Xiaochen, TIAN Xiubo
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State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001 , China
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| Abstract: |
| Multilayer TiN / CrN films can significantly improve the performance and life of components in complex environments. In order to obtain TiN / CrN multifilm with good performance, a new HiPIMS (high-power magnetron sputtering technology) mode with high igniting pulse is proposed. The TiN / CrN multilayer thin films are fabricated by using the new discharge technique in the condition of one to four ignition pulses. The results show that with the increase of ignition pulse number, TiN / CrN film membrane adhesion increase, three binding force under the condition of ignition pulse reach HF1 (indentation method binding force index, HF1 performance good) indentation edge membrane layer is not split, but appear rupture membrane layer under the condition of four pulse ignition membrane adhesion for HF1, and compared with three ignition pulse film rupture also disappear. The adhesion of membrane base is the best. At the same time with the increase of ignition pulse number, the roughness of the membrane layer, narrow grinding crack, hardness increased, the range of hardness is reduced, the film gradually reduce the friction coefficient and friction coefficient is 0.25, under the condition of four pulse ignition membrane layer thickness showed a trend of decrease after the first increase, in three ignition pulse number reaches the maximum under the condition of 332.1 nm. The experimental results show that ignition pulse can strengthen the bonding force between film and matrix, hardness and friction performance, and refine the grain. |
| Key words: TiN / CrN film layer HIPIMS high power pulse number of ignition pulses binding force |
