引用本文:苗晓军,范艳艳,钱旦,李雁淮,宋忠孝,庞亚娟,郝留成.磁控溅射CuCrMo薄膜耐126kV20kA电弧烧蚀性能[J].中国表面工程,2022,35(4):238~247
Miao Xiaojun,Fan Yanyan,Qian Dan,Li Yanhuai,Song Zhongxiao,Pang Yajuan,Hao Liucheng.126 kV 20 kA Arc Erosion Resistance of CuCrMo Film Prepared by Magnetron Sputtering[J].China Surface Engineering,2022,35(4):238~247
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磁控溅射CuCrMo薄膜耐126kV20kA电弧烧蚀性能
苗晓军1, 范艳艳1, 钱旦2, 李雁淮2, 宋忠孝2, 庞亚娟1, 郝留成1
1.平高集团有限公司 平顶山 467001;2.西安交通大学金属材料强度国家重点实验室 西安 710049
摘要:
提升真空断路器 CuCr 触头的抗电弧烧蚀能力是决定其能否应用于高压真空灭弧室的核心关键,尚未见有效触头材料或表面涂层改性技术使 CuCr 触头应用于 126 kV 以上真空灭弧室的报道。基于 CuCrMo 薄膜的优异电气性能,对沉积 CuCrMo 薄膜的真空灭弧室触头进行 126 kV 下的抗电弧烧蚀研究,并进行开断寿命的工程验证。采用磁控溅射技术在 CuCr50 真空触头片表面沉积 5 μm 厚的 CuCrMo 薄膜,对其进行 126 kV 20 kA 电流下 23 次的电寿命试验。利用 XRD、SEM 和 3D 共聚焦显微镜研究电弧烧蚀后表面形貌。研究结果表明:沉积 CuCrMo 薄膜的触头片,在纵向磁场和 126 kV 20 kA 条件下可有效分散电弧,较未镀膜触头片有更小电弧电流密度;经过 23 次电寿命试验后,表面烧蚀程度比未镀膜的触头片轻,表面粗糙度降低,提高了触头的开断寿命。为表面改性真空断路器 CuCr 触头在高电压大电流真空灭弧室的应用提供了有效工程依据。
关键词:  磁控溅射  CuCrMo  电弧烧蚀  126 kV 真空断路器  电寿命
DOI:10.11933/j.issn.1007-9289.20211226001
分类号:TB79;TM89
基金项目:国家电网有限公司总部科技项目“126 kV 真空灭弧室关键工艺技术研究及应用”资助项目(B491BG190013)
126 kV 20 kA Arc Erosion Resistance of CuCrMo Film Prepared by Magnetron Sputtering
Miao Xiaojun1, Fan Yanyan1, Qian Dan2, Li Yanhuai2, Song Zhongxiao2, Pang Yajuan1, Hao Liucheng1
1.Henan Pinggao Electric Co., Ltd., Pingdingshan 467001 , China;2.State Key Laboratory for Mechanical Behavior of Materials, Xi’ an Jiaotong University, Xi’ an 710049 , China
Abstract:
Improving the arc ablation resistance of CuCr contact of vacuum circuit breaker is the core key to determine whether it can be applied to high-voltage vacuum interrupters. There are few effective contact materials or coating technology making CuCr contact being applied to vacuum interrupters above 126 kV. Based on the excellent electrical properties of CuCrMo film, the arc erosion resistance and breaking life of the vacuum interrupter contact deposited with CuCrMo film is studied at 126 kV and its engineering verification of breaking life is carried out. 5 μm CuCrMo film is deposited by magnetron sputtering on the surface of the CuCr50 contactors, and the electrical life experiment is conducted 23 times at 126 kV 20 kA current. The surface microstructure and topography after arc ablation is studied by X-ray diffraction (XRD), second electron microscopy (SEM) and 3D confocal laser scanning microscope. The results show that the CuCrMo coated contactor can effectively disperse the arc and reduce the arc current density under the condition of axial magnetic field and the 126kV 20kA current. After 23 times electric life experiment, the surface erosion is less than the contactor without coating, the surface roughness is reduced, and the life of the contactor is extended. This paper provides an effective engineering basis for the application of modified CuCr contact in high voltage and high current vacuum interrupter.
Key words:  magnetron sputtering  CuCrMo  arc ablation  126 kV vacuum interrupters  electrical life
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