| 引用本文: | 祁宇星,周广学,左潇,都宏,陈仁德,汪爱英.高功率脉冲反应磁控溅射CrNx涂层的放电特性与组分结构[J].中国表面工程,2022,35(5):184~191 |
| QI Yuxing,ZHOU Guangxue,ZUO Xiao1,DU Hong,CHEN Rende,WANG Aiying.Plasma Discharge Characteristics and Microstructure of CrNx Coating Deposited by Reactive HiPIMS[J].China Surface Engineering,2022,35(5):184~191 |
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| 摘要: |
| 高功率脉冲反应磁控溅射技术具有放电等离子密度高、溅射材料离化率高和绕镀性好的特点，已被广泛用于金属氮化物强化涂层的设计制备，但受沉积过程实时在线诊断困难，决定涂层结构性能的关键等离子体特性尚不清晰。基于自主研制的高功率脉冲磁控溅射装备，采用 Langmuir 探针研究不同 N2流量下 CrNx涂层的反应等离子体放电特性与组分结构变化。固定溅射功率为 3 kW，随着 N2流量从 10 mL / min 增加至 75 mL / min，放电峰值功率密度和电子能量分布函数中的高能电子比例均呈现先上升后降低趋势，在 55 mL / min N2流量时达到最高值，其峰值功率密度为 320 W / cm2 。分析表明，当通入过量 N2时，靶中毒程度加剧，因表面生成 CrNx化合物的二次电子发射系数低于 Cr，近基体区电子密度从 3.9×1017 / m3逐渐下降至 2.2×1017 / m3 ，低密度离子入射降低了沉积粒子的热扩散迁移长度，使得涂层呈现 CrN(220)晶面择优柱状生长。 |
| 关键词: 高功率脉冲反应磁控溅射 CrNx涂层 放电特征 Langmuir 探针 微结构 |
| DOI：10.11933/j.issn.1007?9289.20220104002 |
| 分类号:TG174 |
| 基金项目:国家自然科学基金(52025014)和宁波市自然科学基金(202003N4025, 2021J217)资助项目 |
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| Plasma Discharge Characteristics and Microstructure of CrNx Coating Deposited by Reactive HiPIMS |
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QI Yuxing,ZHOU Guangxue,ZUO Xiao1,DU Hong,CHEN Rende,WANG Aiying
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| Abstract: |
| Reactive high power impulse magnetron sputtering (R-HiPIMS) technology is widely used in the deposition of transition metal nitride (TMN) coatings, because of its combine advantages of high ion flux and excellent uniformity over large area deposition. However, there is still a lack of study on the relationship between the plasma discharge behavior of R-HiPIMS and the microstructures of deposited TMN coatings. The CrNx coating as a function of reactive N2 flow rate is fabricated by a home-made HiPIMS technique. Particularly, the dependence of plasma discharge characteristics upon microstructural evolution of CrNx coating is focused by using the Langmuir probe. The results show that, with the increase of N2 flow rate from 10 mL / min to 55 mL / min, both the peak power density and the high-energy electrons ratio increased firstly, where the maximum peak power density value is up to 320 W / cm2 . However, further increasing the N2 flow rate to 75 mL / min stimulated the target poisoning, where the CrNx compound with low secondary electron emission factor is formed on the target surface. Electron density near in the substrate vicinity is decreased from 3.9×1017 / m3 to 2.2×1017 / m3 and the thermal diffusion is suppressed by ion bombardment significantly, which thereafter resulted in the preferred columnar growth of CrN (220) plane with a shorter diffusion length. |
| Key words: reactive high power impulse magnetron sputtering CrNx coating discharge characteristics Langmuir probe microstructure |
