引用本文:吕镖, 胡振峰, 汪笑鹤, 徐滨士.电流密度对镍镀层结构和性能的影响[J].中国表面工程,2013,26(4):66~71
LV Biao, HU Zhen-feng, WANG Xiao-he, XU Bin-shi.Effect of Current Density on the Microstructure and Properties of Plated Nickel Coating[J].China Surface Engineering,2013,26(4):66~71
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电流密度对镍镀层结构和性能的影响
吕镖, 胡振峰, 汪笑鹤, 徐滨士1,2
1. 东北大学 材料与冶金学院， 沈阳 110819;2. 装甲兵工程学院 a. 再制造技术重点实验室 b. 机械产品再制造国家工程研究中心， 北京 100072
摘要:
采用阴极移动电镀技术在电流密度为1~13 A/dm2时制备镍镀层。利用扫描电镜(SEM)、X射线衍射仪(XRD)、X射线应力衍射仪以及硬度计等手段，研究电流密度对镍镀层的表面形貌、结晶取向、孔隙率、内应力和硬度的影响。结果表明：镍镀层的织构和性能随电流密度的变化而改变。当电流密度低于7 A/dm2时，镀层表面球形颗粒较为粗大、孔隙率较高，在为4 A/dm2时，镀层具有最低的拉应力约110 MPa；当电流密度为7 A/dm2时，镀层表面球形颗粒均匀细小，具有最小的表面粗糙度Ra 0.69 μm，最小的孔隙率0.08个/cm2以及最高的硬度330 HV0.1；当电流密度大于7 A/dm2时，镀层的表面粗糙度增加，择优取向由（200）晶面向（220）晶面发生转变，电流密度达到13 A/dm2时，(220)晶面的织构系数达到了85.4%。
关键词:  电镀镍  电流密度  阴极移动  结构  性能
DOI：
分类号:
基金项目:国家自然科学基金(51005244); 国家重点基础研究发展计划(973计划)(2011CB013403); 武器装备预研基金(9140C850201110C8501)
Effect of Current Density on the Microstructure and Properties of Plated Nickel Coating
LV Biao, HU Zhen-feng, WANG Xiao-he, XU Bin-shi1,2
1. School of Materials and Metallurgy, Northeastern University, Shenyang 110819;2a. Science and Technology on Remanufacturing Laboratory, 2b. National Engineering Research Center for Mechanical Products Remanufacturing, Academy of Armored Force Engineering, Beijing 100072
Abstract:
At the current density of 1-13 A/dm2, Ni coatings were prepared by movingcathod electroplating technology. The effects of current density on surface morphology, crystallization orientation, porosity, internal stress and microhardness of Ni electroplating were investigated by scanning electron microscopy (SEM), X-ray diffraction analysis (XRD), X-ray stress tester, micro hardness tester, etc. The results show that Ni coatings have different texture and properties at different current densities. When the current density is below 7 A/dm2, the coatings show coarser surface with spherical particles and higher porosity. However, at the current density of 4 A/dm2, Ni electroplating has the lowest tensile stress about 110 MPa. At the current density of 7 A/dm2, the coatings shows uniformity and fine surface spherical particles, and has the lowest surface roughness of Ra 0.69 μm, lowest porosity of 0.08 dot/cm2 and highest microhardness of 330 HV0.1. When the current density is above 7 A/dm2, the surface roughness of Ni coatings increases, and preferred orientation changes from (200) crystal face to (220) crystal face. When the current density attains 13 A/dm2, and the texture coefficient of (220) crystal face reaches 85.4%.
Key words:  Ni electroplating  current density  moving-cathode  microstructure  property
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