引用本文:
【打印本页】   【HTML】   【下载PDF全文】   View/Add Comment  【EndNote】   【RefMan】   【BibTex】
←前一篇|后一篇→ 过刊浏览    高级检索
本文已被:浏览 2866次   下载 1879 本文二维码信息
码上扫一扫!
分享到: 微信 更多
基体温度对反应共溅射TiN/Ni纳米复合膜结构和耐蚀性的影响
贺春林, 高建君, 王苓飞, 陈宏志, 付馨莹, 马国峰
沈阳大学 辽宁省先进材料制备技术重点实验室, 沈阳 110044
摘要:
为研究基体温度对纳米复合膜结构和耐蚀性的影响,以Ti和Ni为靶材,利用反应磁控共溅射技术在100~400℃温度下沉积了TiN/Ni纳米复合膜,采用XRD、XPS、AFM、FESEM/EDS、电化学技术和划痕试验表征研究复合膜的微结构、耐蚀性和膜基结合力。结果表明:该膜含有面心立方的TiN和Ni相,其择优取向由低温时的TiN(111)面转变为高温时的TiN(200)面。随温度增加,复合膜晶粒尺寸和均方根表面粗糙度先减小后增大,并在温度200℃时达最小。复合膜的界面结合力随温度增加先增大后下降,在300℃时达最大。复合膜具有优异的耐蚀性,其中300℃沉积的膜层腐蚀电流密度最小,较304不锈钢基体约小1个数量级。增加Ni含量有利于提高复合膜的耐蚀性。TiN/Ni纳米复合膜的腐蚀形式为薄膜的局部脱落,穿膜针孔等结构缺陷是引起TiN/Ni纳米复合膜腐蚀失效的根本原因。
关键词:  TiN/Ni  纳米复合膜  磁控反应共溅射  微结构  耐蚀性
DOI:10.11933/j.issn.1007-9289.20170929002
分类号:TG174.444
基金项目:国家自然科学基金(51171118);辽宁省高等学校优秀人才支持计划(LR2013054)
Effects of Substrate Temperature on Microstructure and Corrosion Resistance of Reactive Magnetron Co-sputtered TiN/Ni Nanocomposite Films
HE Chun-lin, GAO Jian-jun, WANG Ling-fei, CHEN Hong-zhi, FU Xin-ying, MA Guo-feng
Liaoning Provincial Key Laboratory of Advanced Materials, Shenyang University, Shenyang 110044
Abstract:
In order to study the effects of substrate temperature on the microstructure and corrosion resistance of TiN/Ni nanocomposite films, these films were deposited at 100-400℃ by reactive magnetron co-sputtering Ti and Ni targets. Microstructure, corrosion resistance and adhesion strength of the deposited films were investigated by XRD, XPS, AFM, FESEM/EDS, electrochemical technologies and scratch tests, respectively. Results show that the TiN/Ni films consist of fcc TiN and Ni phases, and their preferential orientations change from TiN (111) to (200) reflection with the increase of the substrate temperature. When the temperature increases, the grain size and root-mean-square roughness of the nanocomposite films firstly decrease and then increase, reaching at the smallest values at 200℃, while the adhesion strength firstly increases and then decreases with the maximum value at 300℃. The nanocomposite films exhibit excellent corrosion resistance. The film deposited at 300℃ has the lowest corrosion current density, which is about one order of magnitude smaller than that of the 304 stainless steel substrate. It is found that increasing the Ni content can improve the corrosion resistance of the composite films. The corrosion form of the composite films is the local film detachment, associated with structure defects such as through film pores and pinholes present in the films.
Key words:  TiN/Ni  nanocomposite film  reactive magnetron co-sputtering  microstructure  corrosion resistance