| 摘要: |
| 探索具有优良摩擦学性能的BCx薄膜的制备方法具有重要意义，文中采用闭合场非平衡磁控溅射碳化硼靶和石墨靶（纯度均为99.9%）的方法，在38CrMoAl齿轮钢和Si(100)表面沉积BCx薄膜，利用场发射扫描电子显微镜(FESEM)、原子力显微镜(AFM)、拉曼光谱、纳米压入仪、CSM摩擦磨损试验机和X射线光电子能谱仪(XPS)分别分析了BCx薄膜的结构特征、力学性能和摩擦磨损性能，得到了石墨靶电流对碳化硼薄膜结构和性能的影响规律。结果表明：相同的沉积时间内，BCx薄膜的厚度随石墨靶电流的增加逐渐增大，硬度、弹性模量逐渐降低，微观形貌的柱状结构特征越来越明显；增加石墨靶电流可以提高BCx薄膜的摩擦学性能，当石墨靶电流为2.4 A时，BCx薄膜的摩擦因数稳定在0.2左右，且具有最佳的耐磨性能。 |
| 关键词: BCx薄膜 磁控溅射 靶电流 摩擦学性能 |
| DOI：10.11933/j.issn.1007-9289.2015.05.003 |
| 分类号: |
| 基金项目: |
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| Tribological Properties of BCx Films Prepared by Magnetron Sputtering |
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SHANG Lunlin, WANG Liping, ZHANG Guangan, PU Jibin
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State Key Laboratory of Solid Lubrication, Lanzhou Institute of Chemical Physics, Chinese Academy of Sciences
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| Abstract: |
| The preparation methods of BCx films with excellent tribological properties are very significant as its wide application. In this paper, the BCx films were deposited on 38CrMoAl steel and Si(110) by closedfiled unbalanced magnetron sputtering technique, using the boron carbide target and the graphite target with purity of 99.99%. The microstructure, mechanical and tribological performances of the films were analyzed by FESEM, AFM, Raman spectroscopy, nanoindenter, CSM tribometer and XPS. The results indicate that the carbondoped can significantly increase the thickness of the film, furthermore, the cross section morphologies reveal clearer columnar morphology. The hardness and elastic modulus of the films decrease with the increase of carbon content. Additionally, the tribological properties of BCx films can be conspicuously improved by carbondoped, and the best properties are obtained when the current of carbon target is 2.4 A, which have optimal wear resistance and the friction coefficient is about 0.2. |
| Key words: BCx films magnetron sputtering target current tribological properties |
