| 摘要: |
| 采用线性离子束复合磁控溅射的混合PVD技术制备了含Cr过渡层以及Cr掺杂的DLC薄膜，并测量了其厚度、残余应力、结合力、摩擦因数等性能。划痕测试的结果表明，增加过渡层后薄膜的结合状况得到了明显改善，其残余应力也有所下降，Cr掺杂的DLC薄膜残余压应力最低可达0.23 GPa。有关结果为强膜基结合力、低应力、大面积的类金刚石薄膜可控制备提供了新的技术思路。 |
| 关键词: 类金刚石膜 Cr掺杂 过渡层 结合力 残余应力 |
| DOI： |
| 分类号: |
| 基金项目:浙江省科技攻关重点项目（2009C11S550048）；浙江省科技支撑面上项目（2008C21054） |
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| The Effect of Cr-doped and Cr Buffer Layer on the Adhesion of DLC Film |
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SUN Li–li, DAI Wei, ZHANG Dong, WANG Ai–ying
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Ningbo Institute of Materials Technology & Engineering. Chinese Academy of Sciences, Ningbo Zhejiang 315201
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| Abstract: |
| DLC films with different buffer layers were deposited by using a hybrid deposition technology consisted of a novel linear ion beam source and a DC magnetron sputtering process. The thickness, residual stress, tribological properties and adhesion of the DLC films were specifically characterized. The scratch tester results showed that the adhesion between the film and the substrate was significantly improved and the residual stress was decreased by using the buffer layers. In particular, the residual stress of Cr–doped DLC was only about 0.23 GPa. The related results in the present work provided a good way to design the film microstructure to obtain the DLC films with high performance. |
| Key words: diamond–like carbon Cr–doped buffer layer adhesion residual stress |
